From Financialpost · · 1m 10s
Jeol Launches Haxis Microscope for Semiconductors
Jeol begins sales of HAXIS low-angle ion milling SEM for semiconductor failure analysis.
In brief
Jeol begins sales of HAXIS low-angle ion milling SEM for semiconductor failure analysis. Jeol will sell HAXIS, a new low-angle ion milling scanning electron microscope, starting October 5, 2026, to improve semiconductor defect analysis. Originally reported by Financialpost.
HAXIS Launch Announcement
Jeol Ltd. (President & CEO Izumi Oi) announces the development of its new low‑angle ion‑milling scanning electron microscope, HAXIS, and will commence sales on October 5, 2026.
Semiconductor Analysis Challenge
As advanced semiconductor device structures shrink and grow more complex, it has become difficult to contact and measure microscale circuits using nano-manipulators without affecting the analysis target.
HAXIS Technology
HAXIS combines passive voltage contrast detection technology with low-angle ion milling to enable clear, highly reproducible observation of advanced semiconductors.
Key Benefits
The use of argon ensures stable surface quality, reduces running costs, and minimizes processing damage and contamination during semiconductor failure analysis.
LIM Delayering Technique
HAXIS uses a unique low-angle ion milling technique to create a flat surface with minimal damage, enabling clear and highly reproducible passive voltage contrast observation.
Sales Target
Jeol targets 15 units per year for HAXIS, starting sales on October 5, 2026, to support rapid semiconductor failure analysis.
The one thing
Jeol will sell HAXIS, a new low-angle ion milling scanning electron microscope, starting October 5, 2026, to improve semiconductor defect analysis.
